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Titanium Oxide Sputtering Target

CAS #: 13463-67-7
Linear Formula:
TiO2
MDL Number
MFCD00011269
EC No.:
236-675-5

ORDER

Product Product Code ORDER SAFETY DATA Technical data
(3N) 99.9% Titanium Oxide Sputtering Target TI4-OX-03-ST SDS > Data Sheet >
(4N) 99.99% Titanium Oxide Sputtering Target TI4-OX-04-ST SDS > Data Sheet >
(5N) 99.999% Titanium Oxide Sputtering Target TI4-OX-05-ST SDS > Data Sheet >
(2N) 99% Titanium Oxide Rotatable Sputtering Target TI-OX-02-STR SDS > Data Sheet >
(2N5) 99.5% Titanium Oxide Rotatable Sputtering Target TI-OX-025-STR SDS > Data Sheet >
(3N) 99.9% Titanium Oxide Rotatable Sputtering Target TI-OX-03-STR SDS > Data Sheet >
(3N5) 99.95% Titanium Oxide Rotatable Sputtering Target TI-OX-035-STR SDS > Data Sheet >
(4N) 99.99% Titanium Oxide Rotatable Sputtering Target TI-OX-04-STR SDS > Data Sheet >
(5N) 99.999% Titanium Oxide Rotatable Sputtering Target TI-OX-05-STR SDS > Data Sheet >
WHOLESALE/SKU 0000-742-9296

Titanium Oxide Sputtering Target Properties (Theoretical)

Compound Formula O2Ti
Molecular Weight 79.9378 g/mol
Appearance White target
Melting Point 1,843° C (3,349° F)
Boiling Point 2,972° C (5,382° F)
Density 4.23 g/cm3
Solubility in H2O N/A
Exact Mass 79.9378 g/mol
Monoisotopic Mass 79.937776 Da

Titanium Oxide Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety Statements N/A
RTECS Number XR2275000
Transport Information NONH for all modes of transport
WGK Germany nwg

About Titanium Oxide Sputtering Target

Oxide IonAmerican Elements specializes in producing high purity Titanium Oxide Sputtering Targets with the highest possible density High Purity (99.999%) Titanium Oxide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns including circular, rectangular, annular, oval, "dog-bone," rotatable (rotary), multi-tiled and others in standard, custom, and research sized dimensions. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Titanium Oxide as rods, powder and plates. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopoeia/British Pharmacopoeia) and follows applicable ASTM testing standards. Typical and custom packaging is available. Other shapes are available by request.

Synonyms

Titanium(IV) oxide, titanium dioxide, dioxotitanium

Chemical Identifiers

Linear Formula TiO2
Pubchem CID 26042
MDL Number MFCD00011269
EC No. 236-675-5
IUPAC Name dioxotitanium
Beilstein/Reaxys No. N/A
SMILES O=[Ti]=O
InchI Identifier InChI=1S/2O.Ti
InchI Key GWEVSGVZZGPLCZ-UHFFFAOYSA-N
Chemical Formula
Molecular Weight
Standard InchI
Appearance
Melting Point
Boiling Point
Density

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Titanium products. Titanium (atomic symbol: Ti, atomic number: 22) is a Block D, Group 4, Period 4 element with an atomic weight of 47.867. The number of electrons in each of Titanium's shells is [2, 8, 10, 2] and its electron configuration is [Ar] 3d2 4s2. Titanium Bohr ModelThe titanium atom has a radius of 147 pm and a Van der Waals radius of 187 pm. Titanium was discovered by William Gregor in 1791 and first isolated by Jöns Jakob Berzelius in 1825. In its elemental form, titanium has a silvery grey-white metallic appearance. Titanium's properties are chemically and physically similar to zirconium, both of which have the same number of valence electrons and are in the same group in the periodic table. Elemental TitaniumTitanium has five naturally occurring isotopes: 46Ti through 50Ti, with 48Ti being the most abundant (73.8%). Titanium is found in igneous rocks and the sediments derived from them. It is named after the word Titanos, which is Greek for Titans.