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Osmium Oxide Rotatable Sputtering Target

CAS #: 12036-02-1
Linear Formula:
OsO2
MDL Number
MFCD00011150
EC No.:
244-058-7

ORDER

Product Product Code ORDER SAFETY DATA Technical data
(2N) 99% Osmium Oxide Rotatable Sputtering Target OS-OX-02-STR SDS > Data Sheet >
(2N5) 99.5% Osmium Oxide Rotatable Sputtering Target OS-OX-025-STR SDS > Data Sheet >
(3N) 99.9% Osmium Oxide Rotatable Sputtering Target OS-OX-03-STR SDS > Data Sheet >
(3N5) 99.95% Osmium Oxide Rotatable Sputtering Target OS-OX-035-STR SDS > Data Sheet >
(4N) 99.99% Osmium Oxide Rotatable Sputtering Target OS-OX-04-STR SDS > Data Sheet >
(5N) 99.999% Osmium Oxide Rotatable Sputtering Target OS-OX-05-STR SDS > Data Sheet >
WHOLESALE/SKU 0000-742-7086

Osmium Oxide Rotatable Sputtering Target Properties (Theoretical)

Compound Formula OsO2
Molecular Weight 222.229
Appearance Black or Yellow-Brown Crystalline Solid
Melting Point 500 °C (932 °F) (decomposes)
Boiling Point N/A
Density 11400 kg/m-3
Solubility in H2O N/A
Exact Mass 255.941 g/mol
Monoisotopic Mass 255.941 g/mol
Charge 255.941158 Da

Osmium Oxide Rotatable Sputtering Target Health & Safety Information

Signal Word Danger
Hazard Statements H301
Hazard Codes N/A
Precautionary Statements P264-P270-P301+P310-P321-P405-P501
Flash Point Not applicable
Risk Codes N/A
Safety Statements N/A
RTECS Number N/A
Transport Information NONH
WGK Germany NONH
GHS Pictogram
Image
Skull and Crossbones - GHS06

About Osmium Oxide Rotatable Sputtering Target

Oxide IonHigh Purity (99.99%) Metallic Sputtering TargetAmerican Elements specializes in producing high purity Osmium Oxide rotatable sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. Our standard Rotatable Targets for large area thin film deposition are produced either by spray coating on a tubular substrate or casting of a solid tube. Rotary Targets (Cylindrical Targets) are available with dimensions and configurations up to 1,000 mm in length for large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Besides rotary targets we can also provide targets outside in just about any size and shape, such as rectangular, annular, or oval targets. Materials are produced using crystallization , solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form , as well as other machined shapes. We also produce Osmium as disc, granules, ingot, oxide pellets, oxide pieces, oxide powder, and rod. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. Other shapes are available by request.

Synonyms

Osmic acid, Osmium Tetroxide, Perosmic oxide, Osmium(VIII)-oxide, tetraoxoosmium, Perosmic acid anhydride, Tetraketoosmium

Chemical Identifiers

Linear Formula OsO2
Pubchem CID 24884370
MDL Number MFCD00011150
EC No. 244-058-7
IUPAC Name tetraoxoosmium
Beilstein/Reaxys No. N/A
SMILES O=[Os](=O)(=O)=O
InchI Identifier InChI=1S/4O.Os
InchI Key VUVGYHUDAICLFK-UHFFFAOYSA-N
Chemical Formula
Molecular Weight
Standard InchI
Appearance
Melting Point
Boiling Point
Density

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Osmium products. Osmium (atomic symbol: Os, atomic number: 76) is a Block D, Group 8, Period 6 element with an atomic weight of 190.23. Osmium Bohr ModelThe number of electrons in each of osmium's shells is [2, 8, 18, 32, 14, 2] and its electron configuration is [Xe] 4f14 5d6 6s2. The osmium atom has a radius of 135 pm and a Van der Waals radius of 216 pm. Osmium was discovered and first isolated by Smithson Tennant in 1803. Elemental OsmiumIn its elemental form, osmium has a silvery blue cast apperance. Osmium has the highest melting point and the lowest vapor pressure of any of the platinum group of metals it is also the densest naturally ocurring element. Osmium is the least abundant stable element in the earth's crust. It is found in the alloys osmiridium and iridiosmium and as a free element. The origin of the name Osmium comes from the Greek word osme, meaning a smell or odor.