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Niobium Oxide Sputtering Target

CAS #: 1313-96-8
Linear Formula:
Nb2O5
MDL Number
MFCD00011128
EC No.:
215-213-6

ORDER

Product Product Code ORDER SAFETY DATA Technical data
(2N) 99% Niobium Oxide Sputtering Target NB5-OX-02-ST SDS > Data Sheet >
(3N) 99.9% Niobium Oxide Sputtering Target NB5-OX-03-ST SDS > Data Sheet >
(4N) 99.99% Niobium Oxide Sputtering Target NB5-OX-04-ST SDS > Data Sheet >
(5N) 99.999% Niobium Oxide Sputtering Target NB5-OX-05-ST SDS > Data Sheet >
(2N) 99% Niobium Oxide Rotatable Sputtering Target NB5-OX-02-STR SDS > Data Sheet >
(2N5) 99.5% Niobium Oxide Rotatable Sputtering Target NB5-OX-025-STR SDS > Data Sheet >
(3N) 99.9% Niobium Oxide Rotatable Sputtering Target NB5-OX-03-STR SDS > Data Sheet >
(3N5) 99.95% Niobium Oxide Rotatable Sputtering Target NB5-OX-035-STR SDS > Data Sheet >
(4N) 99.99% Niobium Oxide Rotatable Sputtering Target NB5-OX-04-STR SDS > Data Sheet >
(5N) 99.999% Niobium Oxide Rotatable Sputtering Target NB5-OX-05-STR SDS > Data Sheet >
WHOLESALE/SKU 0000-742-6011

Niobium Oxide Sputtering Target Properties (Theoretical)

Compound Formula Nb2O5
Molecular Weight 265.81
Appearance Target
Melting Point 1512 °C (2754 °F)
Boiling Point N/A
Density 4.47 g/cm3
Solubility in H2O N/A
Exact Mass 265.787329
Monoisotopic Mass 265.787329

Niobium Oxide Sputtering Target Health & Safety Information

Signal Word Warning
Hazard Statements H315-H319-H335
Hazard Codes Xi
Precautionary Statements P261-P305 + P351 + P338
Flash Point Not applicable
Risk Codes 36/37/38
Safety Statements 26-36
RTECS Number QU0500000
Transport Information NONH
WGK Germany nwg
GHS Pictogram
Image
Exclamation Point - GHS07

About Niobium Oxide Sputtering Target

Oxide IonAmerican Elements specializes in producing high purity Niobium Oxide Sputtering Targets with the highest possible density High Purity (99.99%) Metallic Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Niobium Oxide as pellets, pieces, powder, and tablets. American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopoeia/British Pharmacopoeia) and follows applicable ASTM testing standards. Typical and custom packaging is available. Other shapes are available by request.

Synonyms

Niobium pentoxide, Columbian pentoxide, Diniobium pentaoxide, Niobium(V) oxide, Niobia, Niobium pentaoxide, Diniobium pentoxide, Diniobium pentaoxide, Niobium(5+) oxide

Chemical Identifiers

Linear Formula Nb2O5
Pubchem CID 123105
MDL Number MFCD00011128
EC No. 215-213-6
IUPAC Name dioxoniobiooxy(dioxo)niobium
Beilstein/Reaxys No. N/A
SMILES O=[Nb](=O)O[Nb](=O)=O
InchI Identifier InChI=1S/2Nb.5O
InchI Key ZKATWMILCYLAPD-UHFFFAOYSA-N
Chemical Formula
Molecular Weight
Standard InchI
Appearance
Melting Point
Boiling Point
Density

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Niobium products. Niobium (atomic symbol: Nb, atomic number: 41) is a Block D, Group 5, Period 5 element with an atomic weight of 92.90638. Niobium Bohr ModelThe number of electrons in each of niobium's shells is 2, 8, 18, 12, 1 and its electron configuration is [Kr] 4d4 5s1. The niobium atom has a radius of 146 pm and a Van der Waals radius of 207 pm. Niobium was discovered by Charles Hatchett in 1801 and first isolated by Christian Wilhelm Blomstrand in 1864. In its elemental form, niobium has a gray metallic appearance. Niobium has the largest magnetic penetration depth of any element and is one of three elemental type-II superconductors (Elemental Niobiumalong with vanadium and technetium). Niobium is found in the minerals pyrochlore, its main commercial source, and columbite. The word Niobium originates from Niobe, daughter of mythical Greek king Tantalus.