Skip to main content

Aluminum Oxide Sputtering Target

CAS #: 1344-28-1
Linear Formula:
Al2O3
MDL Number
MFCD00003424
EC No.:
N/A

ORDER

Product Product Code ORDER SAFETY DATA Technical data
(2N) 99% Aluminum Oxide Sputtering Target AL-OX-02-ST SDS > Data Sheet >
(3N) 99.9% Aluminum Oxide Sputtering Target AL-OX-03-ST SDS > Data Sheet >
(4N) 99.99% Aluminum Oxide Sputtering Target AL-OX-04-ST SDS > Data Sheet >
(5N) 99.999% Aluminum Oxide Sputtering Target AL-OX-05-ST SDS > Data Sheet >
WHOLESALE/SKU 0000-742-12860

Aluminum Oxide Sputtering Target Properties (Theoretical)

Compound Formula Al2O3
Molecular Weight 101.96
Appearance Solid
Melting Point 2,072° C (3,762° F)
Boiling Point 2,977° C (5,391° F)
Density 3.95 g/cm3
Solubility in H2O N/A
Exact Mass 101.948 g/mol
Monoisotopic Mass 101.94782 Da

Aluminum Oxide Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Precautionary Statements N/A
Flash Point Not applicable
Risk Codes N/A
Safety Statements N/A
RTECS Number BD1200000
Transport Information NONH
WGK Germany nwg

About Aluminum Oxide Sputtering Target

High purity aluminum oxidesputtering targetAmerican Elements specializes in producing high purity Aluminum Oxide Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Aluminum Oxide as pellets, pieces, powder, and tablets. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. American Elements produces to many standard grades when applicable, including Mil Spec (military grade); ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; Optical Grade, USP and EP/BP (European Pharmacopoeia/British Pharmacopoeia) and follows applicable ASTM testing standards. Typical and custom packaging is available. Other shapes are available by request.

Synonyms

Alumina; aluminium oxide; aluminum(III) oxide; aluminium(III) oxide; aloxide; aloxite; alundum; oxo-oxoalumanyloxy-alumane, sapphire; corundum; aluminum trioxide; alumina ceramic; alpha-Corundum; bauxite; Electrocorundum; keto-ketoalumanyloxy-alumane; α-Al2O3; α alumina; alpha alumina

Chemical Identifiers

Linear Formula Al2O3
Pubchem CID 14769
MDL Number MFCD00003424
EC No. N/A
IUPAC Name Oxo(oxoalumanyloxy)alumane
Beilstein/Reaxys No. N/A
SMILES O=[Al]O[Al]=O
InchI Identifier InChI=1S/2Al.3O
InchI Key TWNQGVIAIRXVLR-UHFFFAOYSA-N
Chemical Formula
Molecular Weight
Standard InchI
Appearance
Melting Point
Boiling Point
Density

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Shipping documentation includes a Certificate of Analysis and Safety Data Sheet (SDS). Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes, and 36,000 lb. tanker trucks.

Related Elements

See more Aluminum products. Aluminum (or Aluminium) (atomic symbol: Al, atomic number: 13) is a Block P, Group 13, Period 3 element with an atomic weight of 26.9815386. It is the third most abundant element in the earth's crust and the most abundant metallic element. Aluminum Bohr Model Aluminum's name is derived from alumina, the mineral from which Sir Humphrey Davy attempted to refine it from in 1812. Aluminum was first predicted by Antoine Lavoisier 1787 and first isolated by Hans Christian Øersted in 1825. Aluminum is a silvery gray metal that possesses many desirable characteristics. It is light, nonmagnetic and non-sparking. It stands second among metals in the scale of malleability, and sixth in ductility. It is extensively used in many industrial applications where a strong, light, easily constructed material is needed. Elemental AluminumAlthough it has only 60% of the electrical conductivity of copper, it is used in electrical transmission lines because of its light weight. Pure aluminum is soft and lacks strength, but alloyed with small amounts of copper, magnesium, silicon, manganese, or other elements, it imparts a variety of useful properties.